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  • 权利要求
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    • 专利摘要:
    Micromechanical sensor core (100) for an inertial sensor (200) having: a moving seismic mass (10), a defined number of anchor elements for attaching the seismic mass (10) to a substrate, a defined number of stop devices (20) attached to the substrate to abut the seismic mass (10). The stop device (20) has a first elastic stop member (21), a second resilient stop member (23) and a fixed stop member (22). The stop elements (21, 22, 23) are formed so that the seismic mass (10) abuts successively against the first elastic stop element, then the second elastic stop element (23) and then the fixed stop element ( 22).
    公开号:FR3055047A1
    申请号:FR1757583
    申请日:2017-08-08
    公开日:2018-02-16
    发明作者:Barbara Simoni；Christian Hoeppner；Denis Gugel；Guenther-Nino-Carlo Ullrich；Sebastien Guenther；Timm Hoehr；Johannes Seelhorst
    申请人:Robert Bosch GmbH；
    IPC主号:
    专利说明:

    Holder (s): ROBERT BOSCH GMBH.
    Agent (s): CABINET HERRBURGER.
    MICROMECHANICAL SENSOR CORE FOR AN INERTIAL SENSOR.
    FR 3 055 047 - A1 (5 / J Micromechanical sensor core (100) for an inertial sensor (200) having: a mobile seismic mass (10), a defined number of anchoring elements for fixing the seismic mass (10 ) to a substrate, a defined number of stop installations (20) fixed to the substrate to serve as a stop for the seismic mass (10).
    The stop facility (20) has a first elastic stop member (21), a second elastic stop member (23) and a fixed stop member (22). The stop elements (21, 22, 23) are made so that the seismic mass (10) successively abuts against the first elastic stop element, then the second elastic stop element (23) and then the fixed stop element ( 22).

    Field of the invention
    The present invention relates to a micromechanical sensor core for an inertial sensor.
    The invention also relates to a method of manufacturing such a micromechanical sensor core for an inertial sensor.
    State of the art
    The freedom of movement of micromechanical inertial sensors in the form of acceleration sensors is limited by stop elements. A function of the abutment elements mainly consists in minimizing the energy of the mobile mass of the kinetic inertial sensor exerted on the inertial sensor when, under the effect of a strong acceleration, it touches the fixed electrodes of the inertial sensor, to minimize the damage to fixed electrodes.
    Document DE 10 2013 222 747 A1 describes a micromechanical sensor Z which makes it possible to better distribute, using two receiving installations, separated in space, for each pivoting arm, the abutment energy of the arm of the micromechanical sensor Z and thus provide more effective protection of the arm against breakage.
    Purpose of the invention
    The present invention aims to develop an improved micromechanical sensor core for an inertial sensor. Presentation and advantages of the invention
    To this end, the subject of the invention is a micromechanical sensor core for an inertial sensor having: a mobile seismic mass, a defined number of anchoring elements for fixing the seismic mass to a substrate, a defined number of installations of stops fixed to the substrate to serve as a stop for the seismic mass, the stop installation having a first elastic stop element, a second elastic stop element and a fixed stop element, the stop elements being produced so that the mass seismic successively abuts against the first elastic stop element, the second elastic stop element and the fixed stop element.
    Under these conditions, in the event of excessive force, the hooking effect between the seismic mass and the abutment elements is avoided thanks to the return force of the elastic abutment elements, which means that, ultimately, the seismic mass returns to its predefined original position. The second elastic stop element optimizes the overall effect of the force developed by the two elastic stop elements. The first elastic stop element will be greatly and advantageously helped by the second elastic stop element.
    There is thus a structure of cascaded stops for the micromechanical sensor cores of an inertial sensor which advantageously reduce the bonding effect. The robustness of the micromechanical inertial sensor in the event of overload is better.
    According to a development, the subject of the invention is also a method for producing a micromechanical sensor core for an inertial sensor, consisting in using a substrate, using a mobile seismic mass, attaching the seismic mass to the substrate using anchor elements, use a defined number of stop installations to fix the seismic mass, make a first elastic stop element, a second elastic stop element and a fixed stop element on each stop installation, the stop elements being made so that in the event of an impact, the seismic mass arrives first against the first elastic stop element, then against the second elastic stop element and then against the fixed stop element.
    According to an advantageous development of the micromechanical sensor core, the rigidity of the second elastic stop element is, by definition, greater than the rigidity of the first elastic stop element so that there is a behavior of the cascade stops of the two elements of elastic stops.
    According to another advantageous development of the micromechanical sensor core, for each stop installation, there are each time two first elastic stop elements, two second elastic stop elements and two fixed stop elements, symmetrical with respect to the seismic mass. There is thus a better distribution of the effect of the force on the abutment elements.
    According to another advantageous development of the micromechanical sensor core, it has two abutment installations, symmetrical with respect to the seismic mass. This symmetrical arrangement of the abutment installations with respect to the seismic mass means that the operating characteristic of the inertial sensor with the cores of micromechanical sensors as defined will be as regular as possible.
    Drawings
    The present invention will be described below, in more detail with the aid of an example of a micromechanical sensor core represented in the appended drawings in which:
    îo - Figure 1 is a top view of a micromechanical sensor core known for an inertial sensor, Figure 2 is a cut away top view of Figure 1, Figure 3 is a detail view of a mode of production of a micromechanical sensor core according to the invention,
    - Figure 4 is a top view of an embodiment of the micromechanical sensor core according to the invention, Figure 5 shows a block diagram of an embodiment of a method of manufacturing a core of micromechanical sensor for an inertial sensor and,
    - Figure 6 is a block diagram of an inertial sensor with a micromechanical sensor core according to the invention.
    Description of embodiments
    The micromechanical stop and inertial sensor elements can be produced in the form of fixed or elastic structures. The elastic stop elements have the following two functions in particular:
    participate by their deformation in the absorption of critical energy, detach the micromechanical inertial sensor from its state glued or hooked by their restoring forces.
    A difficulty in the design of the elastic abutment elements mentioned above is their correct dimensioning. An overly flexible stop element does not allow it to fulfill its function since it will practically be unable to absorb mechanical energy and it has only a small restoring force. An excessively hard stop element functions like a fixed stop element and does not allow it to fulfill its function.
    FIG. 1 is a top view of a micromechanical sensor core 100, known, for a micromechanical inertial sensor in a plane which captures the accelerations in the xy plane. The sensor core 100 is a spring-mass system with a perforated, mobile seismic mass 10 and anchoring elements 14 which make the connection between the seismic mass 10 and the solid ground substrate located below. The seismic mass 10 is mounted mobile by spring elements 11. In addition, the electrodes 12, 13 produced on the seismic mass cooperate with fixed counter-electrodes (not shown) and in this way capture the accelerations of the seismic mass 10 in the x direction of the xy plane.
    It appears that four anchoring elements 14 are attached to the substrate symmetrically and centrally with respect to the seismic mass 10. The aim is above all not to capture any possible twist of the substrate located under the seismic mass 10 by the inertial sensor. However, thanks to the central arrangement of the four anchoring elements 14, a torsion of the substrate has practically no repercussions in an area of the substrate in the region of the anchoring elements 14.
    FIG. 2 shows an extract on an enlarged scale of a micromechanical sensor core 100 of FIG. 1. There is a first elastic stop element 21 of the stop installation 20 as well as an elongated beam which produces the spring structure elastic or flexible of the first stop element 21. The end of the beam has a head area of enlarged diameter with respect to the beam and serving as a stop against the seismic mass 10. For this, the distance between the head zone and the seismic mass 10.
    A fixed stop element 22 is also produced on the stop installation 20. The fixed stop elements 22 is in the form of a bump and in this way constitutes a rigid stop element which is definitively separated from the seismic mass mobile 10.
    There are thus generally two types of stop element, namely the first elastic stop element 21 whose function is to limit the movement of the seismic mass 10 in the event of mechanical overload. The first elastic stop element 21 is flexible and in the event of mechanical overload of the inertial sensor (for example in the event of a shock from a mobile terminal arriving on the ground) it is first affected by the seismic mass 10; it dampens it elastically and limits its movement. In the event of a greater overload, the beam of the first elastic stop element 21 bends, which blocks the seismic mass 10 in the continuation of its movement, by the fixed stop element 22. This is possible because the interval between the seismic mass 10 and the abutment elements 21, 22 are different; the distance between the first elastic stop element 20 and the seismic mass 10 is defined to be less than the distance between the fixed stop element 22 and the seismic mass 10.
    Overall, four elastic first stop elements 21 are required to neutralize the bonding forces generated in the atomic plane in contact with the seismic mass 10 with the stop elements 21, 22; these bonding forces can stick the seismic mass 10 to the abutment elements 21, 22. The first elastic abutment elements 21 make it possible to reduce this effect in that in the event of deflection of the first elastic abutment elements 21, the elastic force thus generated recalls the seismic mass 10 in its original position.
    An improvement to the conventional structure shown in FIGS. 1 and 2 is proposed.
    FIG. 3 shows a top view of part of an embodiment of a micromechanical sensor core 100 according to the invention. Between the first elastic stop element 21 and the fixed stop element 22 there is, in this case, a second elastic stop element 23 which distributes the energy of mechanical shocks in the event of a stop by the seismic mass 10. The second elastic stop element 23 is also produced on the stop installation 20 and also comprises a beam but which, by comparison with that of the elastic stop element 21 and defined and significantly shorter. In addition, the second elastic stop member 23 has a kind of hammer structure at the end of its head which, in the event of an impact, strikes against the seismic mass 10.
    Functionally, it is provided that the seismic mass 10, in the event of mechanical overload, first arrives against the first elastic stop element 21 then against the second elastic stop element 23 and finally against the fixed stop element 22. Thanks at the spring force thus activated by the two abutment elements 21, 23, the seismic mass 10 is released more effectively than with the conventional structure from its bonding position to be brought back to its undefined rest position.
    For this, the distance between the first elastic stop element 21 and the seismic mass 10 is kept smaller than the distance between the second elastic stop element 23 and the seismic mass 10. In addition, the distance from the second elastic stop element 23 relative to the seismic mass 10 is less than the distance between the fixed stop element 22 and the seismic mass 10.
    Consequently, there are thus sequential abutments in cascade between the seismic mass 10 and the abutment elements 21, 23 and 22.
    In addition, the length of the beams of the elastic stop elements 21, 23 is appropriately dimensioned.
    The sum of the spring forces developed by the elastic stop element 21, 23 is greater than the bonding force between the seismic mass 10 and the stop elements 21, 22, 23, which produces the dropout described.
    The result is that the invention develops a spring structure which allows the seismic mass 10 to come into abutment against the abutment installation 20. Advantageously, the rigidity of the elastic abutment element increases dynamically from the moment at which the seismic mass 10 comes into contact with the first elastic stop element 21.
    Figure 4 is a top view of a sector core 100 as proposed, shown completely. The second elastic stop elements 23 like the first elastic stop elements 21 are generally symmetrical in the two stop directions 20, in four edge zones of the micromechanical sensor core 100. The symmetry of the stop installations 20 and of the élé3055047 stop elements 21, 22, 23 relative to the seismic mass 10 which effectively distributes the forces between the elastic stop elements 21, 23.
    A symmetrical operating behavior and better operating safety of the micromechanical inertial sensor are thus advantageously favored.
    Advantageously, the micromechanical sensor core, as proposed, for each inertial sensor in a plane, can be used to capture accelerations in the plane.
    The impact of a device equipped with a micromechanical sensor core as described above (for example a mobile phone) advantageously has no negative consequences on the inertial sensor.
    FIG. 5 shows the basic flow of an embodiment of a micromechanical inertial sensor according to the invention.
    In step 300, a substrate is produced.
    In step 310, a mobile seismic mass is provided.
    In step 320, the seismic mass 10 is hooked to the substrate using anchoring elements 14.
    In step 330, a defined number of stop installations 20 is used to serve as stops for the seismic mass 10.
    In step 340, a first elastic stop element 21, a second elastic stop element 23 and a fixed stop element 22 are produced for each of the stop installations 20; the stop elements 21, 23, 22 are made so that in the event of a collision, the seismic mass 10 first meets the first elastic stop element 21 then the second elastic stop element 23 and then the fixed stop element 22.
    The order of steps 300 and 310 is arbitrary.
    FIG. 6 is a block diagram of an inertial sensor 200 fitted with micromechanical sensor cores 100 like those defined above.
    In summary, the present invention makes it possible to have better micromechanical sensor cores for an inertial sensor which achieves a behavior of cascade abutment of the seismic mass against the abutment elements and thus optimizes by the restoring force, the elements elastic stop on the seismic mass.
    Although the invention is described above by an example of practical embodiment, it is not in any way limited to this example. Many variations are possible without departing from the scope of the invention.
    NOMENCLATURE
    100
    12, 13 21 20 22 21 10 22
    300-340
    Sensor core
    Mass
    Anchor
    Electrodes
    First elastic stop element
    Stop installation
    Fixed stop element
    First elastic stop element
    Seismic mass
    Fixed stop element
    Steps in a process for manufacturing the micromechanical inertial sensor according to the invention ίο
    权利要求:
    Claims (9)
    [1" id="c-fr-0001]
    1 °) Micromechanical sensor core (100) for an inertial sensor (200) having:
    a movable seismic mass (10), a defined number of anchoring elements (14) for fixing the seismic mass (10) to a substrate, a defined number of stop installations (20) fixed to the substrate to serve as a stop to the seismic mass (10), the stop installation (20) having a first elastic stop element (21), a second elastic stop element (23) and a fixed stop element (22), the stop elements (21, 22, 23) being produced so that the seismic mass (10) successively abuts against the first elastic stop element, then the second elastic stop element (23) and finally the fixed stop element (22).
    [2" id="c-fr-0002]
    2) micromechanical sensor core (100) according to claim 1, characterized in that the rigidity of the second elastic stop element (23) is greater than that of the first elastic stop element (21).
    [3" id="c-fr-0003]
    3) micromechanical sensor core (100) according to claim 1 or 2, characterized in that the stop installation (20) comprises respectively two first elastic stop elements (21), two second elastic stop elements (23) and two fixed stop elements (22), symmetrical with respect to the seismic mass (10).
    [4" id="c-fr-0004]
    4 °) micromechanical sensor core (100) according to claim 3, characterized by two stop installations (20) produced symmetrically with respect to the seismic mass (10).
    [5" id="c-fr-0005]
    5) inertial sensor (200) comprising a micromechanical sensor core (100) according to one of the preceding claims 1 to 4.
    [6" id="c-fr-0006]
    6 °) Process for producing a micromechanical sensor core for
    5 an inertial sensor (100) consisting of: using a substrate, using a mobile seismic mass (10), hanging the seismic mass (10) on the substrate using anchoring elements (14),
    [7" id="c-fr-0007]
    10 - use a defined number of stop installations (20) to fix the seismic mass (10), make a first elastic stop element (21), a second elastic stop element (23) and a fixed stop element ( 22) on each stop installation (20), the stop elements (21, 23, 22)
    [8" id="c-fr-0008]
    15 being made so that in the event of an impact, the seismic mass (10) arrives first against the first elastic stop element (21), then against the second elastic stop element (23) and then against the fixed stop (22).
    [9" id="c-fr-0009]
    20 7 °) Application of a micromechanical sensor core (100) according to one of claims 1 to 4 to an inertial sensor in the plane.
    1/5
    CM
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    DE102016214962A1|2018-02-15|
    FR3055047B1|2021-03-12|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    DE10116931A1|2001-04-05|2002-10-17|Bosch Gmbh Robert|sensor|
    US8011247B2|2008-06-26|2011-09-06|Honeywell International Inc.|Multistage proof-mass movement deceleration within MEMS structures|
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    DE102020209539A1|2020-07-29|2022-02-03|Robert Bosch Gesellschaft mit beschränkter Haftung|Micromechanical acceleration sensor|
    法律状态:
    2018-08-23| PLFP| Fee payment|Year of fee payment: 2 |
    2019-08-22| PLFP| Fee payment|Year of fee payment: 3 |
    2020-06-12| PLSC| Search report ready|Effective date: 20200612 |
    2020-08-27| PLFP| Fee payment|Year of fee payment: 4 |
    2021-08-18| PLFP| Fee payment|Year of fee payment: 5 |
    优先权:
    申请号 | 申请日 | 专利标题
    DE102016214962.8A|DE102016214962A1|2016-08-11|2016-08-11|Micromechanical sensor core for inertial sensor|
    DE102016214962.8|2016-08-11|
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